Journal
EUROPEAN POLYMER JOURNAL
Volume 44, Issue 11, Pages 3564-3570Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.eurpolymj.2008.09.005
Keywords
Surface modification; Atomic layer deposition; Thermoplastics; Al2O3; TiO2; Thin films
Categories
Funding
- Academy of Finland [115601, 201564, 209739, 123248]
- Academy of Finland (AKA) [123248, 123248, 201564, 209739, 115601, 209739, 115601, 201564] Funding Source: Academy of Finland (AKA)
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Al2O3 and TiO2 thin films were deposited by atomic layer deposition at 80-250 degrees C on various polymeric substrates such as polymethylmethacrylate (PMMA), polyetheretherketone (PEEK), polytetrafluoroethylene (PTFE) and ethylenetetrafluoroethylene (ETFE). The films were studied with FESEM, EDX, XRD, contact angle measurements and adhesion tests. The film growth rates on the thermoplastics were close to the corresponding growth rates on Si substrates. The adhesion of the films was good on PEEK and poor on PTFE. All coated surfaces showed lower water contact angles than the uncoated thermoplastics. Furthermore, the water contact angles on all TiO2-coated surfaces decreased upon UV illumination, most efficiently with crystalline TiO2 coatings. (C) 2008 Elsevier Ltd. All rights reserved.
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