Journal
ELECTRONICS LETTERS
Volume 50, Issue 20, Pages 1472-1473Publisher
INST ENGINEERING TECHNOLOGY-IET
DOI: 10.1049/el.2014.2799
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Funding
- French Defence Ministry
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The first demonstration of InSb photodetector with nBn design is reported. The nBn structure, grown by molecular beam epitaxy (MBE) on InSb substrate, is built by using n-type InSb as absorber layer and InAlSb alloy as barrier layer. The nBn detector, showing cut-off wavelength of 5.4 mu m at 77 K in photovoltaic mode, exhibits dark current density as low as 10(-9) A/cm(2) at -50 mV reverse bias, at least two decades lower than usual InSb photodiode.
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