4.3 Article

Performance and performance variations of sub-1 THz detectors fabricated with 0.15 μm CMOS foundry process

Journal

ELECTRONICS LETTERS
Volume 47, Issue 11, Pages 661-662

Publisher

INST ENGINEERING TECHNOLOGY-IET
DOI: 10.1049/el.2011.0687

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Funding

  1. BMBF
  2. Oerlikon AG
  3. WI Bank Hessen
  4. Innovectis GmbH

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Antenna-coupled field-effect transistors were integrated as multi-pixel (5 x 10) detector arrays for electromagnetic radiation between 550 and 600 GHz using commercial 0.15 mu m CMOS process technology. Reported is a minimum optical noise-equivalent-power (NEP) of 43 pW/root Hz and a maximum (capacitive-loading-limited) optical responsivity of 970 V/W (both values averaged). An electrical NEP of 9 pW/root Hz is estimated. Inter-chip variations are analysed with a set of 15 samples showing a low standard deviation of less than 8% for both responsivity and NEP at the optimum operation point. Intra-chip variation is low for non-edge pixels. Both the very good NEP values and the low variations indicate that a cost-efficient CMOS process is well suitable for reliable fabrication of multi-pixel terahertz focal plane arrays.

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