Journal
ELECTRONICS LETTERS
Volume 44, Issue 13, Pages 816-U51Publisher
INST ENGINEERING TECHNOLOGY-IET
DOI: 10.1049/el:20081038
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alpha-Silicon nanowire waveguides and related techniques are studied. An ultra-compact etched diffraction grating demultiplexer with 10 nm spacing is fabricated and characterised. The dimension of the device is around half a millimetre, which is one to two orders of magnitude smaller than conventional silica based devices.
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