Journal
ELECTRONIC MATERIALS LETTERS
Volume 8, Issue 5, Pages 485-489Publisher
KOREAN INST METALS MATERIALS
DOI: 10.1007/s13391-012-2053-7
Keywords
Ag nano particle solution; soft-nano imprint lithography; nano-sized metal pattern; mesh; No residual layer
Categories
Funding
- Technology Innovation Program [R1107151]
- Ministry of Knowledge Economy in Korea
- Korea Evaluation Institute of Industrial Technology
- Ministry of Knowledge Economy in Korea [10040225]
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This paper presents a new simple metal patterning technique, which is based on soft nanoimprint lithography. By using this method with a commercial Ag nano particle ink, a nano-sized metal pattern was successfully fabricated. The problem of the residual layer of patterned Ag layer was minimized by controlling the concentration of the solution and the process conditions. By using this method, we could easily fabricate various patterns without reference to any shape. Furthermore, we fabricated an Ag mesh type pattern for the application of conducting transparent glass.
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