Physicochemical mechanisms of plasma-liquid interactions within plasma channels in liquid

The goal of this study is to advance the fundamental understanding of the physical and chemical mechanisms by which excited radical species produced by electrical plasmas directly in water, OH radicals especially, induce chemical changes in aqueous organic compounds and to exploit this for the development and optimization of drinking and wastewater plasma-based treatment systems. To achieve this goal, this study measured and correlated the production rate of hydrogen peroxide (H2O2) with physicochemical properties of 11 organic compounds. The observed individual correlations between the investigated physicochemical properties and the resulting H2O2 concentrations were used to develop an equation that would allow predicting the measured H2O2 concentration from physicochemical properties of a compound. Results reveal that the production rate of H2O2 directly depends on the surface tension of the solution and compounds' bulk liquid concentration, hydrophobicity (K-ow value), and molecular volume. Other properties such as vapor pressure, Henry's constant, enthalpy of vaporization, ionization energy, electron affinity, and molecular dipole moment do not affect the H2O2 chemistry. K-ow value and surface tension of the solution determine the compound's concentration at the plasma interface. Once at the interface, the molecular volume determines the rate at which the molecule will react with OH radicals.