Journal
ELECTROCHEMISTRY COMMUNICATIONS
Volume 40, Issue -, Pages 31-34Publisher
ELSEVIER SCIENCE INC
DOI: 10.1016/j.elecom.2013.12.007
Keywords
Diamond; pH-selective microelectrode; HFCVD; Galvanic cell
Categories
Funding
- FCT [SFRH/BD/61675/2009, SFRH/BPD/45610/2008]
- FEDER/COMPETE programmme-Portuguese Science and Technology Foundation
- SISET project [269282]
- [PTDC/CTM/108446/2008]
- [PTDC/CTM-MET/113645/2009]
- Fundação para a Ciência e a Tecnologia [SFRH/BD/61675/2009, PTDC/CTM-MET/113645/2009, PTDC/CTM/108446/2008, SFRH/BPD/45610/2008] Funding Source: FCT
Ask authors/readers for more resources
A novel diamond based solid-contact pH-selective microelectrode is reported in the paper for the first time. The diamond films were grown on top of sharp tungsten filaments by HFCVD (Hot Filament Chemical Vapor Deposition). The pH sensitivity of the electrode is achieved via oxygen-termination of the diamond surface with RF oxygen plasma. The MEs were calibrated by zero-current chronopotentiometry registering linearity in the pH 2-12 range. The performance of the diamond microelectrode was demonstrated mapping the pH distribution over corroding Zn-Fe model galvanic cell. (C) 2013 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available