4.0 Article

Influence of Crystalline Constituent on Resistive Switching Properties of TiO2 Memory Films

Journal

ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 12, Issue 4, Pages H135-H137

Publisher

ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.3074332

Keywords

capacitor switching; capacitors; gas mixtures; leakage currents; random-access storage; semiconductor thin films; sputter deposition; titanium compounds

Funding

  1. National Tsing-Hua University of Taiwan, Republic of China
  2. Industrial Technology Research Institute of Taiwan, Republic of China

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TiO2 films were prepared on Pt/Ti/SiO2/Si substrates by radio-frequency reactive sputtering with a different gas mixture. Different constituents of crystalline phases of TiO2 were found by changing the oxygen content in a gas mixture. The influence of crystalline constituent on electrical and resistive switching properties of TiO2 was investigated. The Pt/TiO2/Pt capacitors show reversible and steady bistable resistance switching behavior. The leakage current in the high-resistance state is sensitive to the crystal phase composition of the TiO2 matrix; however, the current flowed through the films in the low-resistance state is hardly affected. Moreover, superior retention characteristics demonstrate the potential for nonvolatile memory applications.

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