Heterodimerization via the Covalent Bonding of Ta@Si16 Nanoclusters and C60 Molecules

Initial products prepared via the surface immobilization of Ta-atom-encapsulated Si-16 cage (Ta@Si-16) nanoclusters on solid surfaces terminated with monolayer films of C-60 molecules were investigated using scanning tunneling microscopy (STM). The STM results indicated that marked aggregation and desorption of surface-immobilized Ta@Si-16 nanoclusters were not induced, even after thermal annealing at similar to 500 K, whereas the local vertical and lateral positions of the Ta@Si-16 nanoclusters with respect to neighboring adsorption sites in the C-60 film were modified. This local positional transition occurred on C-60 monolayer films weakly bonded (via van der Waals forces) to substrates such as highly oriented pyrolytic graphite (HOPG) but did not occur on C-60 monolayer films covalently bonded to substrates such as Si(111)7 x 7. These results indicated that the heterodimer consisting of a Ta@Si-16 nanocluster and a C-60 molecule, Ta@Si-16-C-60, was formed as an initial product via covalent bonding, which inhibited wide-range surface migration of the Ta@Si-16 nano clusters but allowed them to locally change their positions via thermally activated precessional motion. In addition, the transition temperature of the local positional shift was found to decrease as the area density of the surface-immobilized Ta@Si-16 nanoclusters increased,, indicating that the barrier height of the precessional motion of the Ta@Si-16-C-60 heterodimer was decreased due to accumulation of the elastic strain energy generated in the C-60 films.