4.4 Article

Low-voltage blue light emission from n-ZnO/p-GaN heterojunction formed by RF magnetron sputtering method

Journal

CURRENT APPLIED PHYSICS
Volume 14, Issue 3, Pages 345-348

Publisher

ELSEVIER
DOI: 10.1016/j.cap.2013.12.011

Keywords

ZnO film; ZnO/GaN heterojunction; RF magnetron sputtering; Electroluminescence

Funding

  1. National Major Research Program of China [2013CB932602]
  2. Major Project of International Cooperation and Exchanges [2012DFA50990]
  3. NSFC [51232001, 51172022, 51372023]
  4. Fundamental Research Funds for the Central Universities
  5. Program for Changjiang Scholars and Innovative Research Team in University
  6. Beijing Novel Program [2008B19]

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High quality n-ZnO/p-GaN heterojunction was fabricated by growing highly crystalline ZnO epitaxial films on commercial p-type GaN substrates via radio frequency (RF) magnetron sputtering. Low-voltage blue light emitting diode with a turn-on voltage of similar to 2.5 V from the n-ZnO/p-GaN heterojunction was demonstrated. The diode gives a bright blue light emission located at similar to 460 nm and a low threshold voltage of 2.7 V for emission. Based on the results of the photoluminescence (PL) and electroluminescence (EL) spectra, the origins of the EL emissions were studied in the light of energy band diagrams of ZnO-GaN heterojunction, and may attribute to the radiative recombination of the holes in p-GaN and the electrons injected from n-ZnO, which almost happened on the side of p-GaN layer. These results may have important implications for developing short wavelength optoelectronic devices. (C) 2013 Elsevier B. V. All rights reserved.

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