4.4 Article

Electrochemical characteristics of amorphous silicon thin film electrode with fluoroethylene carbonate additive

Journal

CURRENT APPLIED PHYSICS
Volume 14, Issue 4, Pages 596-602

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.cap.2014.02.008

Keywords

Amorphous materials; Chemical vapor deposition; Interface; Thin films

Funding

  1. National Research Foundation of Korea
  2. Korean Government (MEST) [NRF-2010-C1AAA001-2010-0028958]
  3. National Research Foundation of Korea [2012M1A2A2671792] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The electrochemical and compositional changes of a solid electrolyte interphase (SEI) layer formed on the surface of silicon thin film are investigated in order to determine the effect of the content of fluoroethylene carbonate (FEC) additive in the electrolyte. Comparisons are made with FEC-free electrolyte, in which the major components are (CH2OCO2Li)(2) and Li2CO3. The (CH2OCO2Li)(2) and Li2CO3 of the SEI layer in the FEC-containing electrolyte decreases, and polycarbonate and LiF increase relatively with the repression of -OCO2Li groups. The additive affects the composition of the SEI layer, which leads to lower resistance. The electrochemical performance regarding cycle retention, coulombic efficiency, rate capability, and discharge capacity in the FEC-containing cell are significantly enhanced compared to that of the FEC-free electrolyte. The observed optimum FEC concentration in the electrolyte is 1.5%, due to the reduced charge transfer and SEI resistance in our experimental range. (C) 2014 Elsevier B. V. All rights reserved.

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