Growth and characterization of indium oxide films

ln(2)O(3) films have been deposited using chemical spray pyrolysis technique at different substrate temperatures that varied in the range, 250-450 degrees C. The structural and morphological properties of the as-deposited films were studied using X-ray diffractometer and scanning electron microscope as well as atomic force microscope, respectively. The films formed at a temperature of 400 degrees C showed body-centered cubic structure with a strong (222) orientation. The structural parameters such as the crystallite size, lattice strain and texture coefficient of the films were also calculated. The films deposited at a temperature of 400 degrees C showed an optical transmittance of >85% in the visible region. The change of resistivity, mobility, carrier concentration and activation energies with the deposition temperature was studied. The highest figure of merit for the layers grown at 400 degrees C was 1.09 x 10(-3) Omega(-1). (C) 2007 Elsevier B.V. All rights reserved.