4.7 Article

High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography

Journal

CRYSTENGCOMM
Volume 15, Issue 42, Pages 8416-8421

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c3ce41558a

Keywords

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Funding

  1. National Major Research Program of China [2013CB932602]
  2. Program of International ST Cooperation [2012DFA50990]
  3. NSFC [51232001, 51172022, 50972011]
  4. Fundamental Research Funds for the Central Universities
  5. Program for Changjiang Scholars and Innovative Research Team in University
  6. Beijing Novel Program [2008B19]
  7. Program for New Century Excellent Talents [NCET-09-0219]

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Large-scale highly ordered ZnO nanorod arrays with precise period control and uniform distribution are easily fabricated via three-beam interference lithography, top anti-reflective coating and hydrothermal synthesis. This new method demonstrates an efficient way to fabricate large-scale highly ordered semiconductor nanorod arrays and could meet the needs of nanomaterial design, nanodevice optimization and nanosystem integration.

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