4.7 Article

Top-down chemical etching to complex Ag microstructures

Journal

CRYSTENGCOMM
Volume 14, Issue 13, Pages 4335-4343

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c2ce25077b

Keywords

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Funding

  1. Beijing Innovation Talent Project [PHR201006101]
  2. Beijing Municipal Commission of Education Key Foundation [KZ201010005001]
  3. National Natural Science Foundation of China [51002004]
  4. State Key Laboratory of Electronic Thin Films and Integrated Devices [UESTC: KFJJ201001]

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Complex silver (Ag) crystals were crystallized by a technically flexible top-down chemical etching method in a solution phase. Microscale shaped Ag particles were first grown via a galvanic displacement of Ag on commercial Nb metal foil. The metastable Ag precursor was chemically active in solution containing NO3- and HF, readily crystallizing complex Ag microstructured crystals by a HNO3-assisted etching. Insights are gained into the functions of HF and the mechanisms of generating large quantities of anisotropically shaped particles in the solution-phase. The crucial influences of HF concentration and reaction time on the morphology of Ag microstructures have also been established. This current top-down chemical route provides an extremely simple, mild, and effective recipe to crystallize Ag, which is also possible to expand to grow more metal crystals with controlled structures and particle morphologies.

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