Journal
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
Volume 14, Issue 3, Pages -Publisher
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
DOI: 10.1117/1.JMM.14.3.031205
Keywords
directed self-assembly; chemoepitaxy; laser spike annealing; PS-b-PMMA; defectivity; order-disorder transition
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Funding
- National Science Foundation [ECCS-0335765]
- NSF MRSEC program [DMR-1120296]
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Directed self-assembly of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) during laser thermal annealing at peak temperatures of 300 degrees C-800 degrees C for dwells of 1-10 ms has been explored. The enhanced mobility of polymer chains at these temperatures improves registration compared with conventional thermal anneals. PS-b-PMMA films (forming 15-nm line/space standing lamellae) were cast on chemically patterned substrates with a copolymer neutral layer and annealed by laser and hot plate. Annealing by hot plate or multiple laser scans resulted in well-aligned features over micron length scales. By laser annealing multiple times, defectivity was reduced by similar to 60%. However, laser annealing for only 10 ms before performing a hot plate anneal reduced defectivity by >80%. We believe that this reduction arises from improved interfacial alignment of the film to the template during laser annealing near the order-disorder transition. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
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