4.7 Article

Degradation of sulfadiazine antibiotics by water falling film dielectric barrier discharge

Journal

CHINESE CHEMICAL LETTERS
Volume 25, Issue 1, Pages 187-192

Publisher

ELSEVIER SCIENCE INC
DOI: 10.1016/j.cclet.2013.11.003

Keywords

Sulfadiazine; Water falling film dielectric barrier discharge; Degradation efficiency; LC-MS; Degradation pathway

Funding

  1. State Key Laboratory of Pollution Control 82 Resources Reuse

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aqueous solution. The various parameters that affect the degradation of sulfadiazine and the proposed evolutionary process were investigated. The results indicated that the inner concentrations of 10 mg/L sulfadiazine can be all removed within 30 min. The optimum pH value was 9.10 and both strong acidic and alkaline solution conditions were not suitable for the degradation. The degradation of sulfadiazine can be enhanced by the addition of hydrogen radical scavengers, but be inhibited by adding hydroxyl radical scavengers. The water falling film dielectric barrier discharge was rather ineffective in mineralization, because of the intermediates were recalcitrant to be degraded. The existence of Fe2+ and CCl4 in the liquid phase can promote the degradation and mineralization of sulfadiazine. It was found that the degradation of SDZ was enhanced by CCl4 was mainly because of the increase of 'OH due to the reaction of CCI4 with center dot H that reduce the chances of their recombination with center dot OH. Based on the 8 intermediate products identified by LC-MS, the proposed evolution of the degradation process was investigated. (C) 2013 Ya-Bing Sun. Published by Elsevier B.V. on behalf of Chinese Chemical Society. All rights reserved.

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