Journal
CHEMPHYSCHEM
Volume 13, Issue 1, Pages 66-73Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/cphc.201100738
Keywords
electrochemistry; etching; interfaces; solar cells; zinc oxide
Funding
- German Federal Environment Ministry (BMU) [0327693 A, 0325299 A]
- Deutsche Forschungsgemeinschaft (DFG) [PU 447/1-1]
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Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a certain threshold, that is defined by the deposition conditions and etching solution. Additionally, several approaches to modify the etching behavior through special preparation and etching steps are provided.
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