Journal
CHEMISTRY-AN ASIAN JOURNAL
Volume 4, Issue 2, Pages 236-245Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/asia.200800298
Keywords
colloids; lithography; nanostructures; patterning; self-assembly
Categories
Funding
- Max Planck Society
- NSFC [50703015]
Ask authors/readers for more resources
Colloidal lithography relies on using colloidal crystals as masks for etching and deposition, and allows fabrication of various nanostructures on planar and non-planar substrates with low-cost, high-throughput-processing, large fabrication area, and a broad choice of materials. The feature size can easily shrink by decreasing the microsphere diameter in the colloidal mask. The feature shape can be diversified by varying the crystal structure of the colloidal mask, etching the mask, altering the incidence angle of the vapor beam, and stepwise manipulation of the mask registry. This nanochemical patterning strategy paves a complementary way to conventional top-down lithography This focus review provides an overview of the principle of colloidal lithography. and surveys the recent developments as well as outlining the future challenges.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available