4.8 Article

Interfacial Design for Block Copolymer Thin Films

Journal

CHEMISTRY OF MATERIALS
Volume 26, Issue 3, Pages 1471-1479

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/cm403813q

Keywords

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Funding

  1. Nissan Chemical Company
  2. Rashid Engineering Regents Chair
  3. National Science Foundation Scalable Nanomanufacturing Program [1120823]
  4. IBM Ph.D. Fellowship Program
  5. Paul D. Meek Endowed Graduate Fellowship in Engineering
  6. Virginia and Ernest Cockrell, Jr. Fellowships in Engineering
  7. National Merit Scholarship
  8. Arrington Endowed Scholarship
  9. Welch Foundation [F-1709]
  10. National Science Foundation [DGE-1110007]
  11. E.I. DuPont de Nemours Co.
  12. Dow Chemical Company
  13. Northwestern University
  14. U.S. DOE [DE-AC02-06CH11357]
  15. Div Of Electrical, Commun & Cyber Sys
  16. Directorate For Engineering [1120823] Funding Source: National Science Foundation

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Top coat design, coating, and optimization methodologies are introduced that facilitate the synthesis, application, and identification of neutral top coats for block copolymer (BP) thin films. Polymeric top coat composition, controlled via synthesis, determines interfacial wetting characteristics. Trimethylammonium salts of top coats improve solubility and coating uniformity. A confined island and hole test conveniently establishes (non)preferential wetting at the top coat/BP interface, which depends upon top coat composition. The utility of these three concepts was demonstrated with two high-chi, lamella-forming BPs, poly(styrene-block-4-trimethylsilylstyrene) (PS-b-PTMSS) having two periodicities L-0 = 18 and 22 nm and poly(styrene-block-methyltrimethylsilylmethacrylate) (PS-b-PTMSM) with L-0 = 15 nm. The combination of neutral top and bottom interfaces resulted in a perpendicular orientation of lamellae independent of BP :Rim thickness (1-3 L-0) when thermally annealed for 60 s or less.

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