☆ 4.8 Article

Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

CHEMISTRY OF MATERIALS (2011)

Get Full Text
Add to Collection

Journal

CHEMISTRY OF MATERIALS
Volume 23, Issue 20, Pages 4417-4419

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/cm202475e

Keywords

copper; atomic layer deposition; thin films; precursor

Categories

Chemistry, Physical Materials Science, Multidisciplinary

Funding

  1. U.S. National Science Foundation [CHE-0910475]
  2. SAFC Hitech

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.8
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available
Webinars Posters Questions Hubs Funding Journals Papers Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.