☆ 4.8 Article

Novel Organosilicate Polymer Resists for High Resolution E-Beam Lithography

CHEMISTRY OF MATERIALS (2010)

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Journal

CHEMISTRY OF MATERIALS
Volume 22, Issue 10, Pages 3021-3023

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/cm9035456

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Categories

Chemistry, Physical Materials Science, Multidisciplinary

Funding

  1. Ministry of Education, Science and Technology (MEST) of Korea
  2. Chemistry and Molecular Engineering Program of the Brain Korea 21 Project

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