Journal
CHEMISTRY OF MATERIALS
Volume 22, Issue 4, Pages 1445-1451Publisher
AMER CHEMICAL SOC
DOI: 10.1021/cm902337t
Keywords
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Funding
- UMass Center
- National Science Foundation Nanoscale Science and Engineering Center (NSEC) [CMMI-0531171]
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Using templates generated by nanoimprint lithography, we report the fabrication of SiO2 patterns (similar to 450 nm) line widths over large active surface areas (14.5 cm(2)). The process involves the patterning of poly(2-hydroxyethyl methacrylate) (PHEMA) using polycarbonate molds followed by tetrachlorosilane (TCS) vapor cross-linking and supercritical carbon dioxide (scCO(2)) assisted tetraethylorthosilicate (TEOS) infusion. Uniform SiO2 lines were observed over an area 14.5 cm(2), which suggests that this process can be readily scaled.
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