Journal
CHEMICAL VAPOR DEPOSITION
Volume 18, Issue 4-6, Pages 102-106Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.201106973
Keywords
AACVD; Electric field; Gas sensor; Titanium dioxide
Funding
- Royal Society
- EPSRC [EP/H005803/1]
- Engineering and Physical Sciences Research Council [955678] Funding Source: researchfish
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Thin films of titanium dioxide are deposited on gas-sensor substrates at 450?degrees C from the aerosol-assisted (AA)CVD of titanium isopropoxide solutions in toluene under the influence of electric fields. Electric fields are generated by applying a potential difference between the inter-digitated electrodes of the gas-sensor substrate during the deposition. The deposited films are analyzed and characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy (RS). It is found that an increase in electric field strength during deposition causes changes in the film microstructure, preferential orientation, and growth rate. The gas-sensor properties of the films are also examined. It is found that applying an electric field during the deposition improves the film microstructure and leads to a two-fold enhancement in the sensing properties of the film.
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