3.9 Article

Stoichiometry of Nickel Oxide Films Prepared by ALD

Journal

CHEMICAL VAPOR DEPOSITION
Volume 17, Issue 7-9, Pages 177-+

Publisher

WILEY-BLACKWELL
DOI: 10.1002/cvde.201004300

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Funding

  1. German Science Foundation via the DFG (Hamburg) [NI 616/11-1]
  2. German Science Foundation via the DFG (Halle) [HE 2100/8-1]

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Communication: Nickel oxide films obtained from nickelocene and ozone by atomic layer deposition at 230 degrees C are substoichiometric, but have the crystal structure of NiO. Oxygen can be driven out of the solid by annealing under inert atmosphere, or added into it via aerobic annealing.

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