3.9 Review

The CVD of nanodiamond materials

Journal

CHEMICAL VAPOR DEPOSITION
Volume 14, Issue 7-8, Pages 145-160

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.200700037

Keywords

growth; nanocrystalline diamond; nucleation; ultra-nanocrystalline diamond

Funding

  1. Office of Naval Research/Naval Research Laboratory
  2. DARPA/MTO
  3. US Department of Energy, BES-Materials Sciences [DE-AC02-06CH11357]

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The growth and characteristics of nanocrystalline diamond thin films with thicknesses from 20 nm to less than 5 mu m are reviewed. These materials contain between 95% and >99.9% diamond crystallites, the balance being made up from other forms of carbon. Within this class of materials there is a continuous range of composition, characteristics, and properties which depend on the nucleation and growth conditions. It is convenient to classify these films as either ultra-nanocrystalline-diamond (UNCD) or nanocrystalline-diamond (NCD) based on their microstructure, properties, and growth environment. In general, UNCD materials are composed of small particles of diamond ca. 2-5 nm in size with sp(2)-carbon bonding between the particles. UNCD is usually grown in argon-rich, hydrogen-poor CVD environments, and may contain up to 95-98% sp(3)-bonded carbon. NCD materials start with high density nucleation, initiating nanometer-sized diamond domains which grow in a columnar manner with the grain size coarsening with thickness. NCD is generally grown in carbon-lean and hydrogen-rich environments. NCD and UNCD exhibit an interesting range of physical properties which find use in X-ray windows and lithography, micro- and nanomechanical and optical resonators, tribological shaft seats and atomic force microscopy (AFM) probes, electron field emitters, platforms for chemical and DNA sensing, and many other applications.

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