4.7 Article

A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact organic field effect transistors

Journal

CHEMICAL COMMUNICATIONS
Volume 50, Issue 61, Pages 8328-8330

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c4cc01932f

Keywords

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Funding

  1. Ministry of Science and Technology of China [2014CB643600, 2011CB808400, 2011CB932300, 2013CB933403, 2013CB933500]
  2. National Natural Science Foundation of China [20721061, 51033006, 51222306, 51003107, 61201105, 91027043, 91222203, 91233205]
  3. China-Denmark Co-project [60911130231]
  4. NSFC-DFG Transregio Project [TRR61]
  5. Chinese Academy of Sciences

Ask authors/readers for more resources

A novel and universal method, based on water-soluble poly(4-styrene sulfonate), was introduced into the preparation of a polymer mask. Using this mask, high-resolution, high-performance, bottom-gate, top-contact OFETs can be achieved. There is no solvent intervention in the process of manufacturing these OFETs and the mask can be recycled.

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