Journal
CHEMICAL COMMUNICATIONS
Volume 49, Issue 7, Pages 677-679Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c2cc36747e
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Funding
- NSF [DMR-0907324]
- CSC
- National Natural Science Foundation of China [30800256]
- Program for Changjiang Scholars and Innovative Research Team at the Wuhan University of Technology [IRT1169]
- WCU program [R31-10013]
- Ministry of Education, Science, and Technology
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Monolayer graphene was deposited on a Si wafer substrate decorated with SiO2 nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.
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