4.7 Article

Top-down patterning of Zeolitic Imidazolate Framework composite thin films by deep X-ray lithography

Journal

CHEMICAL COMMUNICATIONS
Volume 48, Issue 60, Pages 7483-7485

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c2cc33292b

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Funding

  1. International Synchrotron Access Program (ISAP)
  2. Australian Postgraduate Award Scheme
  3. DECRA Grant [DE120102451]
  4. Advanced Materials (TCP) CSIRO scheme

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For the first time a top-down process was used to control the spatial location of Metal-Organic Frameworks on a surface. Deep X-ray lithography was utilised to micropattern a Zeolitic Imidazolate Framework layer on a sol-gel surface, with exposure hardening the sol-gel by inducing crosslinking while leaving the frameworks intact.

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