Journal
JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY
Volume 64, Issue 3, Pages 955-964Publisher
KLUWER ACADEMIC PUBL
DOI: 10.1023/A:1011579114687
Keywords
atomic layer deposition; chemical vapor deposition; evaporation; precursor; thermogravimetry; vapor pressure
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Normal pressure thermogravimetry (TG) measurements were used to study the sublimation behavior of several volatile metal compounds, used as metal precursors in thin film fabrication by chemical vapor phase methods, like atomic layer deposition (ALD) and chemical vapor deposition (CVD). The results indicated that dynamic TG measurements may be used to find correct source temperatures to be used in an ALD reactor: a good correlation between the source temperatures used in ALD and temperatures corresponding to mass losses of 10 and 50% in TG was verified. It was also found that isothermal TG measurements offer a simple way for the vapor pressure measurements which otherwise are not trivial for solids with only moderate volatility.
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