Journal
OPTICAL AND QUANTUM ELECTRONICS
Volume 34, Issue 1-3, Pages 53-61Publisher
KLUWER ACADEMIC PUBL
DOI: 10.1023/A:1013326610166
Keywords
alternating-layer deposition; ECR etching; electron beam lithography; photonic bandgap; photonic crystal
Ask authors/readers for more resources
We propose two photonic crystal structures that can be created by combining nanolithography with alternating-layer deposition. Photonic band calculations suggest that a drilled alternating-layer photonic crystal combining two-dimensional (2D) alternating multilayers and an array of vertically drilled holes may achieve a full photonic bandgap. In addition, a 3D/2D/3D cross-dimensional photonic crystal, which sandwiches a 2D photonic crystal slab between three-dimensional (3D) alternating-layer photonic crystals, should provide better vertical confinement of light than a conventional index guiding slab. Fabrication techniques based on existing technologies (electron beam lithography, bias sputtering, and low-pressure ECR etching) require very few process steps. Our preliminary fabrication suggests that, by refining these technologies, we will be able to realize photonic crystals.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available