4.4 Article

Atomic layer deposition of BN thin films

Journal

THIN SOLID FILMS
Volume 402, Issue 1-2, Pages 167-171

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(01)01706-0

Keywords

turbostratic; smoothness; boron nitride; chemical vapour

Ask authors/readers for more resources

Boron nitride has for the first time been deposited from gaseous BBr3 and NH3 by means of atomic layer deposition. The deposition temperatures were 400 and 750 degreesC, and the total pressure was 10 torr. The BN films, deposited on silica substrates, showed a turbostratic structure with a c-axis of 0.70 nm at a deposition temperature of 750 degreesC as determined by X-ray diffraction. The films deposited at 400 degreesC were significantly less ordered. The film density was obtained by means of X-ray reflectivity, and it was found to be 1.65-1.70 and 1.90-1.95 g cm(-3) for the films deposited at 400 and 750 degreesC, respectively. Furthermore, the films were, regardless of deposition temperature, fully transparent and very smooth. The surface roughness was 0.3-0.5 nm as measured by optical interferometry. (C) 2002 Elsevier Science B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available