Correlating discrete orientation and grain size to the sputter deposition properties of tantalum

Recent findings indicate that the erosion behavior of tantalum sputtering targets varies across regions of different discrete crystal orientation. Specifically, bands of sharp, localized (100) texture amid the microstructure and aligned parallel to the sputtering surface of planar tantalum targets have been shown to resist erosion. Referencing theoretical models and characterization studies of wrought tantalum, this paper explores the relationship between discrete crystallographic texture and grain size of tantalum with respect to the physical erosion behavior of tantalum sputtering targets. The findings demonstrate that both grain size and preferred orientation contribute to the deposition behavior of tantalum. Also, controlling both the microstructural and textural homogeneity are key to assuring the reliability of Ta targets and the subsequent integrity of the sputter-deposited thin films.