Growth of manganese oxide thin films by atomic layer deposition

Thin films of manganese oxide are made by the ALD (atomic layer deposition) technique using Mn(thd)(3) (Hthd=2,2,6,6-tetramethylheptan-3,5-dione) and ozone as precursors. Pulse parameters for ALD-type growth are established and such growth can be achieved at deposition temperatures between 138 and 210 degreesC. Films have been deposited on both soda-lime glass and Si(100) single crystals. The electrical resistivities of as-deposited films grown on soda-lime glass are measured to be 0.3-3.2 Omega cm (linear four-point-probe measurements). (C) 2003 Elsevier B.V. All rights reserved.