☆ 4.8 Review

Atomic layer deposition chemistry: Recent developments and future challenges

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2003)

Journal

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Volume 42, Issue 45, Pages 5548-5554

Publisher

WILEY-V C H VERLAG GMBH

DOI: 10.1002/anie.200301652

Keywords

atomic layer deposition; microelectronics; nitrides; oxides; thin films

Categories

Chemistry, Multidisciplinary

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