4.4 Article

Sputtered FeCoN soft magnetic thin films with high resistivity

Journal

IEEE TRANSACTIONS ON MAGNETICS
Volume 39, Issue 6, Pages 3559-3562

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TMAG.2003.812715

Keywords

FeCo; high-moment materials; soft magnetic thin films

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Fe70Co30N thin films with thickness from 20 to 1100 Angstrom were prepared by radio-frequency reactive sputtering in an N-2-Ar mixture. The FeCoN films prepared in a low nitrogen flow rate percentage (<6%) and sputtering pressure (<8 mTorr) have a high B-s of about 24.0 kG, but a moderate hard-axis coercivity H-ch of 5-30 Oe. With further increase in N-2 percentage or sputtering pressure, films become significantly softer, with H-ch of about 0.1-0.6 Oe, and have a higher resistivity of up to about 160 muOmega (.) cm. The change in the magnetic properties with nitrogen flow rate percentage and sputtering pressure can be attributed to the formation of an ultrafine grain size nanocrystalline FeCoN thin film as observed by high-resolution transmission electron microscope. The soft properties of FeCoN films with nano-sized crystallites remain stable even after being annealed at 270 degreesC.

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