Journal
MATERIALS LETTERS
Volume 57, Issue 30, Pages 4655-4659Publisher
ELSEVIER
DOI: 10.1016/S0167-577X(03)00379-3
Keywords
ZnO film; substrate temperature; sputtering; photoluminescence
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The influence of substrate temperature on the orientation and optical properties of sputtered ZnO films is studied in the paper. X-ray diffraction (XRD) demonstrates that at the substrate temperature of 350 degreesC, (002) and (004) diffraction peaks of ZnO films have occurred. It reveals that highly c-axis preferential orientation of ZnO film with wurtzite phase was fabricated at 350 degreesC. Besides, the red shift of the absorption band edge, as the substrate temperature increases, is attributed to the high O-2 vapour pressure of ZnO, which causes the vacancies in ZnO films. Meanwhile, photoluminescence (PL) spectrum of the transparent ZnO films deposited at 350 degreesC shows the intrinsic emission peak and a broad green emission band. (C) 2003 Elsevier Science B.V. All rights reserved.
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