4.3 Article

Effects of gamma-ray irradiation on polycrystalline silicon thin-film transistors

Journal

MICROELECTRONICS RELIABILITY
Volume 43, Issue 1, Pages 57-60

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/S0026-2714(02)00119-1

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The effects of gamma-ray irradiation on the performance of polycrystalline silicon thin-film transistors are investigated. After irradiation, the threshold voltage of the TFTs is shifted negatively and well-defined kinks are formed in the subthreshold regions of the transfer characteristics, explained by the turn-on of back channel and sidewall leakage current paths. In the non-irradiated device, the leakage current I-L is controlled by the reverse biased drain junction, while after irradiation IL is limited by the intrinsic resistance of the polysilicon material itself. (C) 2002 Elsevier Science Ltd. All rights reserved.

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