4.5 Article

Magnetic characteristics of Fe4N epitaxial films grown by halide vapor phase deposition under atmospheric pressure

Journal

SOLID STATE SCIENCES
Volume 6, Issue 1, Pages 97-99

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/j.solidstatesciences.2003.11.004

Keywords

Fe4N; AP-HVPE; epitaxial growth; thin film; magnetic materials; SQUID

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The thin films of Fe4N which were prepared by atmospheric pressure halide vapor phase deposition, were epitaxially grown on a MgO(100) substrate and have cubic structure with good crystallinity. The magnetic characteristics of Fe4N epitaxial film show soft magnetic behavior under various temperatures and various external magnetic field directions. As the temperature is decreased, the saturation magnetization increases. Also, the magnetized behavior is observed when the magnetic field is applied parallel to the film plane. It was found that the magnetic moments of Fe4N epitaxial film are facing parallel to the film plane. (C) 2003 Elsevier SAS. All rights reserved.

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