Titanium dioxide thin-film deposition on polymer substrate by light induced chemical vapor deposition

Light induced chemical vapor deposits of titanium dioxide are achieved on poly(methyl methacrylate) substrates from titanium tetraisopropoxide with a long pulse (250 ns) 308 nm XeCl excimer laser, using a mask imaging setup. Similarly to other results obtained on nonpolymeric substrates, localized deposits are achieved in the irradiated area, and the deposited thickness is precisely controlled. This paper focuses on the limitations of the process on polymeric substrates due to laser induced thermal effects. Based both on experimental results and theoretical laser induced temperature rise simulations, the laser induced heating is shown to be responsible for (i) the limitation of the used laser fluence to values below 20 mJ cm(-2) pulse(-1) so as not to damage the substrate, (ii) the appearance of cracks in the deposited films above a certain thickness, and (iii) the amorphous state and the 9% carbon contamination of the deposited material which is obtained at the imposed low fluences. (C) 2004 The Electrochemical Society.