4.0 Article

Positive-working photoimaging materials based on base-amplifying silicone resins having phenylsulfonyl groups

Journal

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
Volume 18, Issue 2, Pages 173-174

Publisher

TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN
DOI: 10.2494/photopolymer.18.173

Keywords

base proliferation; photobase generator; positive-working photoresist; silicone resin

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