Journal
CARBON
Volume 50, Issue 7, Pages 2581-2587Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.carbon.2012.02.016
Keywords
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Funding
- Chinese Academy of Sciences (CAS)
- National Science Foundation of China (NSFC) [10974226, 11074288, 11174333]
- National 973 project of China [2010CB934202, 2012CB921302]
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A simple and efficient method to repair defects in graphene oxide (GO) is reported, accompanied by a simultaneous reduction process by a methane plasma. The graphene after repair is of high quality. For a typical monolayer after repair and reduction, the minimum sheet resistance at the Dirac point and the Raman DIG peak intensity ratio are about 9.0 k Omega/rectangle and similar to 0.53, respectively. (C) 2012 Elsevier Ltd. All rights reserved.
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