☆ 4.8 Article

Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2005)

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Journal

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION
Volume 44, Issue 30, Pages 4707-4712

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/anie.200500092

Keywords

monolayers; photolithography; silanes; surface chemistry

Categories

Chemistry, Multidisciplinary

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