☆ 4.8 Article

The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION (2005)

Journal

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Volume 44, Issue 30, Pages 4749-4753

Publisher

WILEY-V C H VERLAG GMBH

DOI: 10.1002/anie.200500320

Keywords

chemical vapor deposition; crystal growth; nitrides; plasma chemistry; reaction mechanisms

Categories

Chemistry, Multidisciplinary

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