Journal
SOLAR ENERGY
Volume 80, Issue 6, Pages 701-706Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.solener.2005.10.011
Keywords
antireflection; textured surface; photoelectrochemical solar cells; porous silicon; electroless deposition
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Antireflection of silicon (Si) surface is one key technology for the manufacture of efficient solar cells. Metal particle enhanced HF etching is applied to produce uniform antireflecting porous layer on multicrystalline Si wafers that cannot be uniformly texturized by anisotropic etching with an alkaline solution. Fine platinum (Pt) particles are deposited on multicrystalline n-Si wafers by electroless displacement reaction in a hexachloroplatinic acid solution containing HF. Both macroporous and luminescent microporous layers are uniformly formed by immersing the Pt-particle-deposited multicrystalline Si wafers in a HF solution. The reflectance of the wafers is reduced from 30% to 6% by the formation of porous layer. The photocurrent density of photoelectrochemical solar cells using porous multicrystalline n-Si has a 25% higher value than non-porous Si cells. (c) 2005 Elsevier Ltd. All rights reserved.
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