Atomic layer deposition of TiO2 on mesoporous silica

Ultra-thin layers of titanium dioxide are conformally grown within the pores of an ordered mesoporous silica, SBA-15, using atomic layer deposition, reducing the pore size from the original value of 67 A to a final value of 32 A. Analysis of the nitrogen isotherms indicated a conformal growth process in which both the internal surface area of the mesoporous material and the external surface was coated. Published by Elsevier B.V.