Fabrication of biological nanostructures by scanning near-field photolithography of chloromethylphenylsiloxane monolayers

We demonstrate the fabrication of sub-100-nm DNA surface patterns by scanning near-field optical lithography using a near-field scanning optical microscope coupled to a UV laser and a chloromethylphenylsiloxane (CMPS) self-assembled monolayer (SAM). The process involves 244-nm exposure of the CMPS SAM to create nanoscale patterns of surface carboxylic acid functional groups, followed by their conversion to the N-hydroxysuccinimidyl ester and reaction of the active ester with DNA to spatially control DNA grafting with high selectivity.