Journal
JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY
Volume 177, Issue 1, Pages 68-75Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jphotochem.2005.05.013
Keywords
photocatalysis; titanium dioxide; nitrogen doping; ALD; thin films
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Titanium dioxide (TiO2) is recognized as the most efficient photocatalytic material, but due to its large band gap energy it call only be excited by UV irradiation. Doping TiO2 with nitrogen is a promising modification method for the utilization of visible light in photocatalysis. In this work, nitrogen-doped TiO2 films were grown by atomic layer deposition (ALD) using TiCl4, NH3 and water as precursors. All growth experiments were done at 500 degrees C. The films were characterized by XRD, XPS, SEM and UV-vis spectrometry. The influence of: nitrogen doping oil the photocatalytic activity of the films in the UV and visible light was evaluated by the degradation of a thin layer of stearic acid and by linear sweep voltammetry. Light-induced superhydrophilicity of the films was also studied. It was found that the films could be excited by visible light, but they also suffered from increased recombination. (c) 2005 Elsevier B.V. All rights reserved.
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