Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 9, Issue 7, Pages C110-C113Publisher
ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.2200141
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Electrochemical deposition of hematite (alpha-Fe2O3) thin films was investigated on SnO2:F covered glass substrates. A new electrochemical method to obtain hematite thin films through a potential cycling procedure in an aqueous solution of Fe(III)+KF+H2O2 at room temperature is presented. The electrodeposited iron oxide thin films submitted to an annealing treatment showed a good quality and crystallinity. X-ray diffraction analysis confirmed the presence of the rhombohedrally centered hexagonal structure: alpha-Fe2O3, hematite, as the sole crystalline phase. A bandgap energy of ca. 2.0 eV was measured for these films. (c) 2006 The Electrochemical Society.
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