Journal
CHEMICAL COMMUNICATIONS
Volume -, Issue 39, Pages 4021-4023Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/b708480c
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A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
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