MgB2 thin films by hybrid physical-chemical vapor deposition

Hybrid physical-chemical vapor deposition (HPCVD) has been the most effective technique for depositing MgB2 thin films. It generates high magnesium vapor pressures and provides a clean environment for the growth of high purity MgB2 films. The epitaxial pure MgB2 films grown by HPCVD show higher-than-bulk T-c due to tensile strain in the films. The HPCVD films are the cleanest MgB2 materials reported, allowing basic research, such as on magneto resistance, that reveals the two-band nature of MgB2. The carbon-alloyed HPCVD films demonstrate record-high H-C2 values promising for high magnetic field applications. The HPCVD films and multilayers have enabled the fabrication of high quality MgB2 Josephson junctions. (c) 2007 Elsevier B.V. All rights reserved.